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Scalability of MOCVD-Deposited Hafnium Oxide

Author(s):
Elshocht, S. Van
Carter, R.
Caymax, M.
Claes, M.
Conard, T.
Date, L.
Gendt, S. De
Kaushik, V.
Kerber, A.
Kluth, J.
Lujan, G.
Petry, J.
Pique, D.
Richard, O.
Rohr, E.
Shimamoto, Y.
Tsai, W.
Heyns, M. M.
13 more
Publication title:
CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
765
Pub. date:
2003
Page(from):
59
Page(to):
64
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997028 [1558997024]
Language:
English
Call no.:
M23500/765
Type:
Conference Proceedings

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