Polymorphous Silicon Films Produced in Large Area Reactors by PECVD at 27.12 MHz and 13.56 MHz

Polymorphous Silicon Films Produced in Large Area Reactors by PECVD at 27.12 MHz and 13.56 MHz

Author(s):

Aguas, H.

Raniero, L.

Pereira, L.

Fortunato, E.

Cabarrocas, P. Roca i

Martins, R.

1 more

Publication title:

Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

762

Pub. Year:

2003

Page(from):

589

Page(to):

594

Pages:

6

Pub. info.:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996991 [1558996990]

Language:

English

Call no.:

M23500/762

Type:

Conference Proceedings

Details

TDL ID:	ZA00014420
Series ID:	PA00000011
Conf. info. (Name):	Symposium on amorphous and nanocrystalline silicon-based films
Conf. info. (Number):	2003
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2003.04.22-2003.04.25

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