Physical and Electrical Characterization of Hafnium Silicate Thin Films

Physical and Electrical Characterization of Hafnium Silicate Thin Films

Author(s):

Lysaght, Patrick S.

Publication title:

Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

747

Pub. Year:

2003

Page(from):

133

Page(to):

138

Pages:

6

Pub. info.:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558996847 [1558996842]

Language:

English

Call no.:

M23500/747

Type:

Conference Proceedings

Details

TDL ID:	ZA00014407
Series ID:	PA00000011
Conf. info. (Name):	Symposium on crystalline oxide-silicon heterostructures and oxide optoelectronics
Conf. info. (Number):	2002
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2002.12.02-2002.12.04

Similar Items:

1 Conference Proceedings Physical and Electrical Characterization of Hafnium Silicate Thin Films Lysaght, Patrick S., Foran, Brendan, Bersuker, Gennadi, Larson, Larry, Murto, Robert W., Huff, Howard R. Materials Research Society	7 Conference Proceedings SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE Peterson, J., Barnett, J., Young, C., Hou, A., Gutt, J., Gopalan, S., Lee, C.H., Li, H.J., Moumen, N., Chaudhary, N., … Electrochemical Society
2 Conference Proceedings Challenges in Integrating the High-K Gate Dielectric Film to the Conventional CMOS Process Flow Agarwal, Avinash, Freiler, Michael, Lysaght, Pat, Perrymore, Loyd, Bergmann, Renate, Sparks, Chris, Bowers, Bill, … Materials Research Society	8 Conference Proceedings Identifying Contributions to Electrical Instability in High-k Gate Stacks: As-Grown vs. Generated Defects G. Bersuker, P. Lysaght, R. Choi Electrochemical Society
3 Conference Proceedings Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface Barnett, Joel, Moumen, N., Gutt, J., Gardner, M., Huffman, C., Majhi, P., Peterson, J.J., Gopalan, S., Foran, B., Li, … Materials Research Society	9 Conference Proceedings Ultra-Thin Zirconium and Hafnium Silicate Films Deposited by MOCVD on Si(100) D. Landheer, X. Wu, H.-W. Chen, M.-S. Lee, S. Moisa, T.-Y. Huang, T.-S. Chao, Z.H. Lu, W. N. Lennard Electrochemical Society
4 Conference Proceedings Gate Dielectric Thickness Control for High-K and Conventional Gate Stacks in the Presence of Chemical Oxides from Pre-gate Clean Processes for Sub-180 nm MOSFET … Guan, Jay J., Gale, Glenn W., Bersuker, Gennadi, Bergmann, Renate, Agarwal, Avinash, Jackson, Mike, Huff, Howard Electrochemical Society	10 Conference Proceedings 18 CVD of Hafnium Silicate Thin films for Advanced Gate Applications Sharangpani, R., Muthukrishnan, S., Kher, S., Narwankar, P., Goyani, T., Ma, Y., Ahmed, K., Conti, G. Electrochemical Society
5 Conference Proceedings Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique Karamcheti, A., Watt, V. H. C., Luo, T. Y., Brady, D., Shaapur, F., Vishnubhotla, L., Gale, G., Huff, H. R., Jackson, M. … MRS-Materials Research Society	11 Conference Proceedings The Influence of NH₃ Anneal on the Crystallization Kinetics of HfO₂ Gate Dielectric Films P. Lysaght, J. Bornett, J. Woicik, B. Foran, G. Bersuker, B. Lee Electrochemical Society
6 Conference Proceedings Effects of Structural Properties of Hf-Based Gate Stack on Transistor Performance Bersuker, G., Sim, J.H., Young, C.D., Choi, R., Lee, B.H., Lysaght, P., Brown, G.A., Zeitzoff, P.M., Gardner, M., Murto, … Materials Research Society	12 Conference Proceedings * Sub-100 nm Gate Stack/Ultra Shallow Junction Integration Challenges Huff, H.R., Brown, G.A., Larson, L.A., Murto, R.W. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12