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The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration

Author(s):
Kaushik, V.S.
Gendt, S.De
Carter, R.
Claes, M.
Rohr, E.
Pantisano, L.
Kluth, J.
Kerber, A.
Cosnier, V.
Cartier, E.
Tsai, W.
Young, E.
Green, M.
Chen, J.
Jang, S-A.
Lin, S.
Delabie, A.
Elshocht, S.V.
Manabe, Y.
Richard, O.
Zhao, C.
Bender, H.
Caymax, M.
Heyns, M.
19 more
Publication title:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
745
Pub. date:
2003
Page(from):
335
Page(to):
342
Pages:
8
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996823 [1558996826]
Language:
English
Call no.:
M23500/745
Type:
Conference Proceedings

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