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Effect of Al-Content and Post Deposition Annealing on the Electrical Properties of Ultra-Thin HfAlxOy Layers

Author(s):
Carter, R.J.
Tsai, W.
Young, E.
Caymax, M.
Maes, J.W.
Chen, P.J.
Delabie, A.
Zhao, C.
Gendt, S.De
Heyns, M.
5 more
Publication title:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
745
Pub. date:
2003
Page(from):
35
Page(to):
40
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996823 [1558996826]
Language:
English
Call no.:
M23500/745
Type:
Conference Proceedings

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