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Epitaxial Oxide Films on Silicon: Growth, Modeling and Device Properties

Author(s):
Droopad, R.
Wang, J.
Eisenbeiser, K.
Yu, Z.
Ramdani, J.
Curless, J.A.
Overgaard, C.D.
Finder, J.M.
Hallmark, J.A.
Kaushik, V.
Nguyen, B.Y.
Marshall, D.S.
Ooms, W.J.
8 more
Publication title:
Recent developments in oxide and metal epitaxy : theory and experiment
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
619
Pub. Year:
2000
Page(from):
155
Page(to):
166
Pages:
12
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558995277 [1558995277]
Language:
English
Call no.:
M23500/619
Type:
Conference Proceedings

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