Development of a Post-Spacer Etch Clean to Improve Silicide Formation
- Author(s):
- Publication title:
- Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 611
- Pub. Year:
- 2001
- Page(from):
- C5.3
- Pub. info.:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995192 [1558995196]
- Language:
- English
- Call no.:
- M23500/611
- Type:
- Conference Proceedings
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