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Integration Challenges For Advanced Salicide Processes And Their Impact On CMOS Device Performance

Author(s):
Wieczorek, Karsten
Horstmann, Manfred
Engelmann, Hans-Jtrgen
Dittmar, Kornelia
Blum, Werner
Sultan, Akif
Besser, Paul R.
Frenkel, Austin
3 more
Publication title:
Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
611
Pub. date:
2001
Page(from):
C5.1
Pub. info.:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558995192 [1558995196]
Language:
English
Call no.:
M23500/611
Type:
Conference Proceedings

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