Gas Phase And Surface Kinetic Processes In Hot-Wire Chemical Vapor Deposition

Gas Phase And Surface Kinetic Processes In Hot-Wire Chemical Vapor Deposition

Author(s):

Publication title:

Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

609

Pub. Year:

2001

Page(from):

A6.2

Pub. info.:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558995178 [155899517X]

Language:

English

Call no.:

M23500/609

Type:

Conference Proceedings

Details

TDL ID:	ZA00014197
Series ID:	PA00000011
Conf. info. (Name):	Symposium on amorphous and heterogeneous silicon thin films
Conf. info. (Number):	2000
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2000.04.24-2000.04.28

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