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Relation Between Growth Precursors And Film Properties For Plasma Deposition Of a-Si:H At Rates Up To 100 A/s

Author(s):
Boogaarts, M. G. H.
Hoefhagels, J. P. M.
Kessels, W. M. M.
Schram, D. C.
Smets, A. H. M.
VandeSen, M. C. M.
1 more
Publication title:
Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
609
Pub. Year:
2001
Page(from):
A4.2
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558995178 [155899517X]
Language:
English
Call no.:
M23500/609
Type:
Conference Proceedings

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