Electrodeposition of NiFe Thin Films and NiFe/Cu Multilayers With a Recirculating Electrochemical Flow Reactor

Electrodeposition of NiFe Thin Films and NiFe/Cu Multilayers With a Recirculating Electrochemical Flow Reactor

Author(s):

Publication title:

Polycrystalline metal and magnetic thin films : symposium held April 5-8, 1999, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

562

Pub. Year:

1999

Page(from):

81

Page(to):

86

Pages:

6

Pub. info.:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558994690 [1558994696]

Language:

English

Call no.:

M23500/562

Type:

Conference Proceedings

Details

TDL ID:	ZA00014190
Series ID:	PA00000011
Conf. info. (Name):	Symposium on polycrystalline metal and magnetic thin films
Conf. info. (Number):	1999
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1999.04.05-1999.04.08

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