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High-Rate Growth of Stable a-Si:H

Author(s):
Futako, W.
Hayashi, R.
Hondo, M.
Matsuda, A.
Nishimoto, T.
Payne, A.
Takagi, T.
Takai, M.
3 more
Publication title:
Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
557
Pub. Year:
1999
Page(from):
105
Page(to):
114
Pages:
10
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558994645 [1558994645]
Language:
English
Call no.:
M23500/557
Type:
Conference Proceedings

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