Fullerene Derivatives as Novel Resist Materials for Fabrication of MEMS Devices by Electron Beam Lithography
- Author(s):
Robinson, A.P.G Palmer, R.E. Preece, J.A. Shelley, E.J. Kanayama, T. Tada, T. - Publication title:
- Materials science of microelectromechanical systems (MEMS) devices : symposium held December 1-2, 1998, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 546
- Pub. Year:
- 1999
- Page(from):
- 219
- Page(to):
- 224
- Pages:
- 6
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994522 [1558994521]
- Language:
- English
- Call no.:
- M23500/546
- Type:
- Conference Proceedings
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