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Optimization of nanomachining repair condition for ArF lithography

Author(s):
Amano, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Nishiguchi, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hashimoto, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
White, R. ( RAVE LLC (USA) )
Bozak, R. ( RAVE LLC (USA) )
Terrill, L. ( RAVE LLC (USA) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
538
Page(to):
545
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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