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In Situ Chemical Concentration Monitoring and Control of HF Oxide Etch Processes

Author(s):
Lindquist, P.G.
Butler, J.N.
Jarvis, T.D.
Kelly, J.D.
Hall, R.M.
Rosato, J.J.
1 more
Publication title:
Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-33
Pub. Year:
1994
Page(from):
277
Page(to):
282
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770927 [1566770920]
Language:
English
Call no.:
E23400/951106
Type:
Conference Proceedings

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