Silicon Nitride And Oxynitride Film Formation Using Electron Cyclotron Resonance Plasmas

Silicon Nitride And Oxynitride Film Formation Using Electron Cyclotron Resonance Plasmas

Author(s):: Barbour, J.C.
Publication title:: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Title of ser.:: Electrochemical Society Proceedings Series
Ser. no.:: 1994-16
Pub. Year:: 1994
Page(from):: 505
Page(to):: 514
Pages:: 10
Pub. info.:: Pennington, NJ: Electrochemical Society
ISSN:: 01616374
ISBN:: 9781566770484 [1566770483]
Language:: English
Call no.:: E23400/942240
Type:: Conference Proceedings

Details

TDL ID:	ZA00014125
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Conf. info. (Number):	3rd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.05.23-1994.05.27

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