High Rate Deposition Of Silicon Dioxide Using PECVD For MCM Applications
- Author(s):
- Publication title:
- Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 1994-16
- Pub. Year:
- 1994
- Page(from):
- 208
- Page(to):
- 217
- Pages:
- 10
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770484 [1566770483]
- Language:
- English
- Call no.:
- E23400/942240
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
7
Conference Proceedings
Fabrication and Characterization of a-SiNx:H Alloys by PECVD Using N2 and SiH4
Electrochemical Society |
Materials Research Society |
Society of Photo-optical Instrumentation Engineers |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
10
Conference Proceedings
RECENT OBSERVATIONS OF MICROCAVITIES IN CVD DIAMOND: THEIR EFFECTS ON MCM PROCESSING
Electrochemical Society |
American Institute of Chemical Engineers |
Materials Research Society |
6
Conference Proceedings
DEPOSITION OF FLUORINATED SILICON NITRIDE USING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION TECHNIQUE
Materials Research Society |
Electrochemical Society |