EFFECTS OF DRYING METHODS AND WETTABILITY OF SILICON ON THE FORMATION OF WATER MARKSIN SEMICONDUCTOR PROCESSING

EFFECTS OF DRYING METHODS AND WETTABILITY OF SILICON ON THE FORMATION OF WATER MARKSIN SEMICONDUCTOR PROCESSING

Author(s):: Park, J.-G.
Publication title:: Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III
Title of ser.:: Electrochemical Society Proceedings Series
Ser. no.:: 1994-9
Pub. Year:: 1994
Page(from):: 228
Page(to):: 240
Pages:: 13
Pub. info.:: Pennington, NJ: Electrochemical Society
ISSN:: 01616374
ISBN:: 9781566770415 [1566770416]
Language:: English
Call no.:: E23400/941386
Type:: Conference Proceedings

Details

TDL ID:	ZA00014118
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing
Conf. info. (Number):	3rd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.05.23-1994.05.27

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