Blank Cover Image

*CHARACTERIZATION AND CONTROL OF WAFER CHARGING EFFECTS DURING HIGH-CURRENT ION IMPLANTATION

Author(s):
Current, M.I.
Lucaszek, W.
Dixon, W.
Vella, M.C.
Messick, C.
Shideler, J.
Reno, S.
2 more
Publication title:
Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-9
Pub. Year:
1994
Page(from):
49
Page(to):
58
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770415 [1566770416]
Language:
English
Call no.:
E23400/941386
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings IN-SITU CONTROL OF WAFER CHARGE NEUTRALIZATION DURING HIGH CURRENT ION IMPLANTS

Shauly, E. N., Koltin, E., Munin, I., Avrahamov, Y.

MRS - Materials Research Society
7 Conference Proceedings THE CHARGE STATE OF IRON IONS IMPLANTED INTO SAPPHIRE

McHargue, C. J., Sklad, P. S., White, C. W., Farlow, G. C., Perez, A., Kornilios, N., Marest, G.

Materials Research Society
2 Conference Proceedings CHARM-2: a new tool for characterization of wafer charging in ion- and plasma-based IC processing equipment

W. Lukaszek, J. Reedholm, M.I. Current, N. Tripsas

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings EFFECTS OF NITROGEN ION IMPLANTATION IN 304 STAINLESS STEEL AT HIGH TEMPERATURES

Shrivastava, Sadhna, Tarey, Ram D., Bhatnager, M.C., Jain, Amitabh, Chopra, K.L.

Materials Research Society
3 Conference Proceedings THE EFFECTS OF HIGH AND LOW DOSE HYDROGEN ION IMPLANTATIONS ON Al/n-Si SCHOTTKY DIODES

Yapsir, A. S., Hadizad, P., Lu, T. -M., Corelli, J. C., Corbett, J. W., Lanford, W. A., Bakhru, H.

Materials Research Society
9 Conference Proceedings EFFECTS AND BEHAVIOR OF IMPLANTED FLUORINE IN HIGH TEMPERATURE SUPERCONDUCTORS

Tesmer, J. R., Maggiore, C. J., Nastasi, M., Cheong, S-W., Dick, C-M.

Materials Research Society
4 Conference Proceedings Charge-State Defect Engineering of Silicon During Ion Implantation

Brown, R. A., Ravi, J., Erokhin, Y., Rozgonyi, G. A., White, C. W.

MRS - Materials Research Society
10 Conference Proceedings THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL

Binns, M.I., Kommu, S., Seacrist, M.R., Standley, R.W., Wise, R., Myers, D.J., Tisserand, D., Doyle, D.

Electrochemical Society
5 Conference Proceedings Charge State Defect Engineering of Silicon During Ion Implantation

Brown, R. A., Ravi, J., Erokhin, Y., Rozgonyi, G. A., White, C. W.

MRS - Materials Research Society
11 Conference Proceedings HIGH CURRENT DENSITY IMPLANTATION AND ION BEAM ANNELAING IN Si

Holland, O. W, Narayan, J.

North-Holland
6 Conference Proceedings Preparation and Characterization of Silicon Nanostructures Obtained by Ion Implantation

Mestanza, S. N. M., Dias, G. O., Queiroz, J. E. C., Doi, I., Swart, J. W., Rodriguez, E., Neves, A. A. R., Martinho, H.

Electrochemical Society
12 Conference Proceedings ION IMPLANTATION AND ANNEALING OF OXIDES

White, C.W., Boatner, L.A., Skland, P.S., McHargue, C.J., Pennycook, S.J., Aziz, M.J., Farlow, G.C., Rankin, J.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12