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AFM OBSERVATION OF Si (100) SURFACE AFTER HYDROGEN ANNEALING AND WET CHEMICAL PROCESSING

Author(s):
Yanase, Y.
Horie, H.
Oka, Y.
Sano, M.
Sumita, S.
Shigematsu, T.
1 more
Publication title:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-7
Pub. date:
1994
Page(from):
546
Page(to):
553
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770385 [1566770386]
Language:
English
Call no.:
E23400/941397
Type:
Conference Proceedings

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