CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH
- Author(s):
- Publication title:
- Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 1994-7
- Pub. Year:
- 1994
- Page(from):
- 401
- Page(to):
- 408
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770385 [1566770386]
- Language:
- English
- Call no.:
- E23400/941397
- Type:
- Conference Proceedings
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