Blank Cover Image

ECR OXYGEN PLASMA CLEANING OF OXIDE ETCHED SURFACES

Author(s):
Publication title:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-7
Pub. Year:
1994
Page(from):
319
Page(to):
328
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770385 [1566770386]
Language:
English
Call no.:
E23400/941397
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings COMPARISON OF IN SITU, ISOTROPIC DOWNSTREAM, AND INDUCTIVELY COUPLED PLASMA DOWNSTREAM POST-CONTACT ETCH CLEANING

Mikulan, P.I., Koo, T.T., Fonash, S.J., Reinhardt, K.A.

Electrochemical Society
7 Conference Proceedings OXIDE DEGRADATION RESULTING FROM PHOTORESIST ASHING

Mikulan, P. I., Koo, T. T., Awadelkarim, O. O., Fonash, S. J., Ta, T., Chan, Y. D.

MRS - Materials Research Society
2 Conference Proceedings Damage Resulting from Polysilicon Gate Etching: Effect of Electrode Age and Sequencing within a Cassette

Mikulan, P.I., Awadelkarim, O.O., Fonash, S.J., Reinhardt, K.A., Rembetski, J.F.

Electrochemical Society
8 Conference Proceedings DRY SURFACE CLEANING OF PLASMA-ETCHED HEMTs

Pearton, S.J., Ren, F., Katz, A., Chakrabarti, U.K., Lane, E., Hobson, W.S., Kopf, R.F., Abernathy, C.R., Wu, C.S., …

Materials Research Society
3 Conference Proceedings *SURFACE CONDITIONING ISSUES RELATED TO PATTERNING AND ETCHING

Fonash, S.J., Ditizio, R.A., Gu, T., Mikulan, P.I., Awadelkarim, O.O., Collins, R.W., Rembetski, J.F., Reinhardt, K.A., …

Materials Research Society
9 Conference Proceedings Low Temperature Polycrystalline Silicon Thin Films Deposited by ECR Plasma

Kalkan, A.K., Bae, S., Farber, D.G., Fonash, S.J.

Electrochemical Society
4 Conference Proceedings Electrical Characterization of Damage Phenomena Induced in Silicon by Magnetically-Enhanced Reactive Ion Etching

Awadelkarim, O.O., Gu, T., Mikulan, P.I., Fonash, S.J., Reinhardt, K., Chan, Y.D.

Electrochemical Society
10 Conference Proceedings Effects of Oxide Etching on Silicon Substrate Quality

Reinhardt, K., White, A., Marks, J., DiVincenzo, B., Gu, T., Fonash, S.

Electrochemical Society
5 Conference Proceedings AN EFFECTIVE IN-SITU O2 HIGH DENSITY PLASMA CLEAN

Reinhardt, K., Divincenzo, B., Yang, C.-L., Arleo, P., Marks, J., Mikulan, P., Gu, T., Fonash, S.

MRS - Materials Research Society
11 Conference Proceedings Use of beam profile reflectometry to determine depth of silicon etch damage and contamination

Reinhardt,K.A., Kelso,S.M.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings An Assessment of Damage Resulting from Resist Stripping

Mikulan, P.I., Koo, T.T., Awadelkarim, O.O., Fonash, S.J., Ta, T., Chan, Y.D.

Electrochemical Society
12 Conference Proceedings Silicon micromachining and its impact on materials and device properties: plasma etching damage issues

O.O. Awadelkarim, T. Gu, S.J. Fonash

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12