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COMPARISON OF IN SITU, ISOTROPIC DOWNSTREAM, AND INDUCTIVELY COUPLED PLASMA DOWNSTREAM POST-CONTACT ETCH CLEANING

Author(s):
Publication title:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-7
Pub. Year:
1994
Page(from):
307
Page(to):
312
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770385 [1566770386]
Language:
English
Call no.:
E23400/941397
Type:
Conference Proceedings

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