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IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES

Author(s):
Tardif, F.
Joly, J.P.
Lardin, T.
Tonti, A.
Patruno, P.
Levy, D.
Sievert, W.
2 more
Publication title:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-7
Pub. Year:
1994
Page(from):
85
Page(to):
93
Pages:
9
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770385 [1566770386]
Language:
English
Call no.:
E23400/941397
Type:
Conference Proceedings

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