A Methodology for Optimizing Gate Oxide Pre-Clean

A Methodology for Optimizing Gate Oxide Pre-Clean

Author(s):

Publication title:

Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing II

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

1994-3

Pub. Year:

1994

Page(from):

15

Page(to):

25

Pages:

11

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770651 [1566770653]

Language:

English

Call no.:

E23400/941395

Type:

Conference Proceedings

Details

TDL ID:	ZA00014113
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing ; Electrochemical Spring Meeting
Conf. info. (Number):	2nd ; 1993
Conf. info. (Venue):	Honolulu, Hawaii, USA
Conf. info. (Date):	1993.05.16-1993.05.22

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