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Comparison of Polysilicon Etching between Pure and Nitrogen Added Chlorine ECR Plasmas

Author(s):
Publication title:
Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-21
Pub. Year:
1993
Page(from):
141
Page(to):
148
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770668 [1566770661]
Language:
English
Call no.:
E23400/932473
Type:
Conference Proceedings

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