Blank Cover Image

CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY

Author(s):
Mertens, P.W.
Meuris, M.
Schmidt, H.F.
Verhaverbeke, S.
Heyns, M.M.
Carr, P.
Graeff, D.
Schnegg, A.
Kubota, M.
Dillenbeck, K.
de Blank, R.
6 more
Publication title:
Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-15
Pub. Year:
1993
Page(from):
87
Page(to):
102
Pages:
16
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770590 [1566770599]
Language:
English
Call no.:
E23400/932030
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides

Verhaverbeke, S., Meuris, M., Mertens, P., Schmidt, H., Heyns, M.M., Philipossian, A., Graeff, D., Dillenbeck, K.

Electrochemical Society
7 Conference Proceedings SILICON SURFACE ROUGHENING BY THE DECOMPOSITION OF HYDROGEN PEROXIDE

Mertens, P.W., Verhaverbeke, S., Heyns, M.M., Hellemans, L., Snauwaert, J., Dillenbeck, K.

Electrochemical Society
2 Conference Proceedings NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES

Heyns, M. M., Verhaverbeke, S., Meuris, M., Mertens, P. W., Schmidt, H., Kubota, M., Philipossian, A., Dillenbeck, K., …

MRS - Materials Research Society
8 Conference Proceedings IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS

Teerlinck, I., Schmidt, H.F., Rotondaro, A.L.P., Hurd, T.Q., Mouche, L., Mertens, P.W., Meuris, M., Heyns, M.M., …

Electrochemical Society
3 Conference Proceedings HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES

Verhaverbeke, S., Bender, H., Meuris, M., Mertens, P. W., Schmidt, H. F., Heyns, M. M.

MRS - Materials Research Society
9 Conference Proceedings In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements

Schmidt, H.F, Teerlinck, I., Meuris, M., Mertens, P.W., Heyns, M.M.

Electrochemical Society
4 Conference Proceedings A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES

Meuris, M., Verhaverbeke, S., Mertens, P.W., Schmidt, H.F., Rotondaro, A.L.P., Heyns, M.M., Philipossian, A.

Electrochemical Society
10 Conference Proceedings 18 Optimized HF Solutions in ULSI Technology

Teerlinck, I., Mertens, P.W., Vos, R., Meuris, M., Heyns, M.M.

Electrochemical Society
5 Conference Proceedings *CLEANING OF METAL CONTAMINATION

Mertens, P.W., Hurd, T.Q., Graf, D., Meuris, M., Schmidt, H.F., Heyns, M.M.

Electrochemical Society
11 Conference Proceedings SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

Verhaverbeke, S., Alay, J., Mertens, P., Meuris, M., Heyns, M., Vandervorst, W., Murrell, M., Sofield, C.

Materials Research Society
6 Conference Proceedings MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS

Verhaverbeke, S., Meuris, M., Schmidt, H., Mertens, P., Heyns, M.

Electrochemical Society
12 Conference Proceedings COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES

Elsmore, C., Hurd, T.Q., Clarke, J., Meuris, M., Mertens, P.W., Heyns, M.M.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12