Blank Cover Image

SOI Technology for Deep-Submicron CMOS Applications,

Author(s):
Colinge, J.-P.  
Publication title:
Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-13
Pub. Year:
1993
Page(from):
39
Page(to):
54
Pages:
16
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770637 [1566770637]
Language:
English
Call no.:
E23400/932028
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Device/Circuit modeling and simulation applied to design of Deep-Submicron SOI CMOS technology

Fossum, J.G., Yeh, P.C., Suh, D., Krishnan, S.

Electrochemical Society
7 Conference Proceedings Potential of Surface Accumulation Mode for Deep-Submicron Fully-Depleted SOI CMOS Technologies

Iniguez, B., Rauly, F., Flandre, D.

Electrochemical Society
2 Conference Proceedings Gate-All-Around Technology for Harsh Environment Applications

Colinge, J.P.

Kluwer Academic Publishers
8 Conference Proceedings Advanced Device Structures and Technology Issues for Deep Submicron CMOS

Pfiester, J.R.

Electrochemical Society
3 Conference Proceedings On the evolution of SOI materials and devices

Colinge, J.P.

Kluwer Academic Publishers
9 Conference Proceedings A methodology for the characterization of arithmetic circuits on CMOS deep submicron technologies

Estrada, A., Jimenez, C. J., Valencia, M.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Study of integration issues in shallow trench isolation for deep submicron CMOS technologies

Chatterjee,A., Mason,M.E., Joyner,K., Rogers,D., Mercer,D., Kuehne,J., Esquivel,A.L., Mei,P., Murtaza,S.S., Taylor,K.J., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Effect of argon or nitrogen preamorphized implant on SALICIDE formation for deep submicron CMOS technology

Ho,C.S., Pey,K.L., Wong,H., Karunasiri,R.P.G., Chua,S.J., Lee,K.H., Tang,Y., Wong,S.M., Chan,L.H.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Dual gate SOI MOSFET: physics and potential

Colinge, J P

Electrochemical Society
11 Conference Proceedings Investigation of salicide processes for thin film SOI microwave applications

Chen, J., Colinge, J.P., Flandre, D., Gillon, R., Raskin, J.P., Vanhoenacker, D.

Electrochemical Society
6 Conference Proceedings Radiation damage in deep submicron partially depleted SOI CMOS

Simoen, E., Rafi, J.M., Mercha, A., Serra-Gallifa, X., van Meer, H., De Meyer, K., Claeys, C., Kokkoris, M., …

Electrochemical Society
12 Conference Proceedings SOI for Harsh Environment Applications in the USA

Colinge, C.A.

Kluwer Academic Publishers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12