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DIMINUTION OF ELECTRICAL ACTIVITY AND REDUCTION OD DIEEFUSION OD ARSENIC IMPLANTED IN SILICON BY SIMULTANEOUS IMPLANTATION OF BORON IONS

Author(s):
Yokota, K.
Sunagawa, Y.
Miyashita, F.
Hirao, T.
Horino, Y.
Satho, M.
Ando, Y.
Matsuda, K.
3 more
Publication title:
Proceedings of the Third International Symposium on Process Physics and Modeling in Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-6
Pub. Year:
1993
Page(from):
556
Page(to):
564
Pages:
9
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770644 [1566770645]
Language:
English
Call no.:
E23400/930578
Type:
Conference Proceedings

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