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CHARGING EFFECTS ON ION TRAJECTORIES IN PLASMA ETCHING

Author(s):
Publication title:
Proceedings of the Third International Symposium on Process Physics and Modeling in Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-6
Pub. Year:
1993
Page(from):
483
Page(to):
490
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770644 [1566770645]
Language:
English
Call no.:
E23400/930578
Type:
Conference Proceedings

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