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Challenges in Integration of Metal Gate High-k Dielectrics Gate Stacks

Author(s):
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2004-01
Pub. date:
2004
Page(from):
321
Page(to):
327
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774062 [1566774063]
Language:
English
Call no.:
E23400/200401
Type:
Conference Proceedings

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