Factors Influencing the Threshold Voltages of Metal Oxide CMOS Devices
- Author(s):
Hobbs, C. Fonseca, L. Samavedam, S. Grant, J. Dhandapani, V. Taylor, B. Dip, L. Triyoso, D. Gilmer, D. Schaeffer, J. Hegde, R. Tseng, H White, B. Tobin, P. - Publication title:
- Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2004-01
- Pub. Year:
- 2004
- Page(from):
- 313
- Page(to):
- 320
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774062 [1566774063]
- Language:
- English
- Call no.:
- E23400/200401
- Type:
- Conference Proceedings
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