Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
- Author(s):
Kraus, P.A. Chua, T.C. Rothschild, A. Cubaynes, F.N Veloso, A. Mertens, S. Date, L. Baue, T.M. Ahmed, K.Z. Campbell, J. Noun, F. Cruse, J. Schreutelkamp, R. Schaekers, M. - Publication title:
- Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2004-01
- Pub. Year:
- 2004
- Page(from):
- 236
- Page(to):
- 243
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774062 [1566774063]
- Language:
- English
- Call no.:
- E23400/200401
- Type:
- Conference Proceedings
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