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Nickel SALICIDE Technology for Sub-100 nm CMOS Devices

Author(s):
Lu, J.P.
Miles, D.
Li-Fatou, A.
Xu, Y.Q.
Zhao, J.
Gurba, A.
Griffin, A., Jr.
Hornug, B.
Hewson, M.
Grider, T.
Mercer, D.
Montgomery, C.
7 more
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2004-01
Pub. Year:
2004
Page(from):
159
Page(to):
173
Pages:
15
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774062 [1566774063]
Language:
English
Call no.:
E23400/200401
Type:
Conference Proceedings

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