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CHARACTERIZING ETCH RESIDUE REMOVAL FROM LOW-k ILD STRUCTURES USING AQUEOUS AND NON-AQUEOUS CHEMISTRIES

Author(s):
Publication title:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-26
Pub. Year:
2003
Page(from):
340
Page(to):
347
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774116 [156677411X]
Language:
English
Call no.:
E23400/200326
Type:
Conference Proceedings

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