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EFFECT OF RIE SEQUENCE AND POST-RIE SURFACE PROCESSING ON THE RELIABILITY OF GATE OXIDE lN A TRENCH

Author(s):
Grebs, T.
Ridley, R.
Chang, K.
Wu, C.-T.
Agarwal, R.
Mytych, J.
Dimachkie, W.
Dolny, G.
Michalowicz, J.
Ruzyllo, J.
5 more
Publication title:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-26
Pub. Year:
2003
Page(from):
108
Page(to):
115
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774116 [156677411X]
Language:
English
Call no.:
E23400/200326
Type:
Conference Proceedings

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