IMPROVEMENTS IN ADVANCED GATE OXIDE ELECTRICAL PERFORMANCE BY THE USE OF AN OZONATED WATER CLEAN RPOCESS

IMPROVEMENTS IN ADVANCED GATE OXIDE ELECTRICAL PERFORMANCE BY THE USE OF AN OZONATED WATER CLEAN RPOCESS

Author(s):

Publication title:

Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2003-26

Pub. Year:

2003

Page(from):

100

Page(to):

107

Pages:

8

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774116 [156677411X]

Language:

English

Call no.:

E23400/200326

Type:

Conference Proceedings

Details

TDL ID:	ZA00014088
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
Conf. info. (Number):	8th ; 2003
Conf. info. (Venue):	Orlando, Florida, USA
Conf. info. (Date):	2003.10.00

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