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SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE

Author(s):
Peterson, J.
Barnett, J.
Young, C.
Hou, A.
Gutt, J.
Gopalan, S.
Lee, C.H.
Li, H.J.
Moumen, N.
Chaudhary, N.
Lee, B.H.
Bersuker, G.
Zietzoff, P.
Brown, G.A.
Lysaght, P.
Gardner, M.
Murto, R.W.
Huff, H.
13 more
Publication title:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-26
Pub. Year:
2003
Page(from):
93
Page(to):
99
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774116 [156677411X]
Language:
English
Call no.:
E23400/200326
Type:
Conference Proceedings

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