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STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK

Author(s):
Chang, K.
Shanmugasundaram, K.
Lee, D.-O.
Roman, P.
Shallenberger, J.
Chang, F.-M.
Wang, J.
Beck, R.
Mumbauer, P.
Grant, R.
Ruzyllo, J.
6 more
Publication title:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-26
Pub. date:
2003
Page(from):
78
Page(to):
85
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774116 [156677411X]
Language:
English
Call no.:
E23400/200326
Type:
Conference Proceedings

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