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EFFECTIVE POST-ETCH RESIDUE REMOVAL ON LOW-K FILMS USING SINGLE WAFER PROCESSING

Author(s):
Kesters, E.
Ghekiere, J.
Van Doorne, P.
Vereecke, G.
Mertens, P.W.
Heyns, M.M.
1 more
Publication title:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-26
Pub. date:
2003
Page(from):
15
Page(to):
22
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774116 [156677411X]
Language:
English
Call no.:
E23400/200326
Type:
Conference Proceedings

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