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56. Performance of nitrided Hf-silicate high-k gate dielectrics

Author(s):
Jeon, J.
Arasnia, Q.Xiang; F.
Zhong, J.
Goo, J.S.
Halliyol, A.
Kim, H.S.
Clark-Phelps, B.
Zhong, H.
Ogle, B.
4 more
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-14
Pub. Year:
2003
Page(from):
451
Page(to):
458
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
Language:
English
Call no.:
E23400/200314
Type:
Conference Proceedings

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