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53. Effect of thermal annealing on mist-deposited HISiO4/SiO,/Si structures

Author(s):
Chong, K.
Lee, D.-O.
Shanmugosondoroni, K.
Romon, P.
Shallenberger, J.
Wang, I.
Mumbaner, P.
Grant, R.
Rusyllo, J.
4 more
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-14
Pub. date:
2003
Page(from):
429
Page(to):
436
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
Language:
English
Call no.:
E23400/200314
Type:
Conference Proceedings

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