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45. TaN metal gate MOSFETs with aggressively scaled HfO2 dielectrics

Author(s):
Lander, R.
Schram, T.
Lulan, G.S.
hooker, J.
Vertommen, J.
Lee, S.
de Weerd, W.
Boullart, W.
van Elshocht, S
Carter, R.
Kubicek, S.
Demeyer, K.
De Gendt, S.
Heyns, M.
9 more
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-14
Pub. date:
2003
Page(from):
367
Page(to):
374
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
Language:
English
Call no.:
E23400/200314
Type:
Conference Proceedings

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