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34 Rapid thermal annealing of atomic layer deposited hafnium-silicate/poly-silicon layers

Author(s):
Rittersma, Z.M.
Massoubre, D.
Roozeboorn, F.
Verheijen, M.A.
van Berkum, J.G.M
Tamminga, Y.
Dao, F.
Snijders, J.H.M
Vainonen-Ahigren, E.
Fois, F.
Tuominen, M.
Haukka, S.
7 more
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-14
Pub. date:
2003
Page(from):
273
Page(to):
280
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
Language:
English
Call no.:
E23400/200314
Type:
Conference Proceedings

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