Blank Cover Image

15 Ultra-shallow implant anneal using a short-wavelength flash light source

Author(s):
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-14
Pub. Year:
2003
Page(from):
111
Page(to):
118
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
Language:
English
Call no.:
E23400/200314
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Ultra-Shallow Junction Implant Anneal Using Xenon Arc Flash Lamps

Yoo, W.S., Kang, K.

Electrochemical Society
7 Conference Proceedings Spin-on-Glass Bake and Cure Using a Resistively Heated Batch Annealing Oven

Yoo, W.S., Fukada, T., Hiraga, Y., Kang, K., Yamamoto, J.

Electrochemical Society
2 Conference Proceedings 6 Ultraviolet Raman Spectroscopic Study on Flash-Anneal Recrystallization of Ultra-Shallow Boron-Implanted Layer on Silicon

Yoshimoto, M., Nishigaki, H., Harima, H., Kang, K., Yoo, W. S.

Electrochemical Society
8 Conference Proceedings Annealing Characteristics of Copper Films for Power Device Applications

Yoo, W.S.

Electrochemical Society
3 Conference Proceedings 9 Ultra Shallow Junction Formation by Flash Annealing: The Challenges Aheac

Foggiato, J., Yoo, W.S.

Electrochemical Society
9 Conference Proceedings Ultra-Shallow Junction Formation by Low Energy Ion Implantation and Flash Lamp Annealing*

Suguro, K., Ito, T., Itani, T., linuma, T.

Electrochemical Society
4 Conference Proceedings 8 Characterization of Ultra-Shallow Implanted P+ Layer on P-Type Silicon Substrates after Flash Anneal and Conventional Rapid Thermal Anneal

Suzuki, T., Seto, M., Suzuki, N., Kang, K., Yoo, W. S.

Electrochemical Society
10 Conference Proceedings 2 Pattern effects during spike annealing of ultra-shallow implants

Niess, J., Ndnyei, Z., Lerch, W., Paul, S.

Electrochemical Society
5 Conference Proceedings Dry Oxidation and Implant Anneal in a Single Wafer Rapid Thermal Furnace

Fukada, T., Yoo, W.S., Hiraga, Y., Kang, K., Kitayama, H.

Electrochemical Society
11 Conference Proceedings Ultra-Shallow Junctions Formed by Co-Implantation and Sub-Melt Laser Annealing

S. B. Felch, A. Falepin, S. Seven, E. Augendre, T. Noda, V. Parihar, F. Nouri, T. Hoffinann, B. Pawlak, P. Eyben, W. …

Electrochemical Society
6 Conference Proceedings Rapid Thermal Implant Annealing using Cold Wall and Hot Wall Systems

Yoo, W.S., Fukada, T., Setokubo, T., Aizawa, K., Yamamoto, J., Komatsubara, R.

Electrochemical Society
12 Conference Proceedings Rapid annealing of ion implanted silicon structures using a radiant light source

Harrison, H.B., Grigg, M., Short, K.T., Williams, J.S., Zylewicz, A.

North Holland
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12