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13 The role of fluorine with Ge pre-amorphization in forming pMOS junctions for the 65-nm CMOS technology node

Author(s):
Pawlak, B.J
Lindsay, R.
Surdeanu, R.
Pages, X.
Vandervorsi, W.
Jeugd, K. v. d.
1 more
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-14
Pub. Year:
2003
Page(from):
99
Page(to):
104
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
Language:
English
Call no.:
E23400/200314
Type:
Conference Proceedings

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