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Selective Silicon Nitride Etching by ECR Plasmas Using SF6 and NF3 Based Gas Mixtures

Author(s):
Publication title:
Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-9
Pub. date:
2003
Page(from):
292
Page(to):
301
Pages:
10
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773898 [156677389X]
Language:
English
Call no.:
E23400/200309
Type:
Conference Proceedings

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