Blank Cover Image

Mechanism of Oxygen Contamination in PECVD a-Si:H Films

Author(s):
Publication title:
Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-8
Pub. Year:
2003
Page(from):
701
Page(to):
707
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773782 [1566773784]
Language:
English
Call no.:
E23400/200308
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Microscopic beam profile and its relationship with the poly-Si film morphology grown laterally by a phase-modulated excimer-laser crystallization method

Kimura, Y., Jyumonji, M., Hiramatsu, M., Nishitani, M., Malsumura, M.

Electrochemical Society
7 Conference Proceedings Batch Processing Method to Deposit a-Si:H Films by PECVD

Raniero, L., Aguas, H., Pereira, L., Fortunato, E., Ferreira, I., Martins, R.

Trans Tech Publications
2 Conference Proceedings The Role of H in the Growth Mechanism of PECVD a-Si:H

Kessels, W. M. M., Korevaar, B. A., Schram, D. C., Severens, R. J., Smets, A. H. M., vandeSen, M. C. M.

Materials Research Society
8 Conference Proceedings An Advanced Sample Structure for Excimer Laser Crystallization

Hiramatsu, M., Ogawa, H., Jyumonji, M., Katou, T., Akita, N., Matsumura, M.

Electrochemical Society
3 Conference Proceedings Preparation of P-Type Microcrystal Si:H Films by ECR-PECVD

X.Y. Zhang, A.M. Wu, H.Y. Yue, J.A. Hu, L.S. Wen

Trans Tech Publications
9 Conference Proceedings THE ROLE OF THE SPECIES FORMED IN PECVD SYSTEMS ON THE DENSITY OF STATES OF a-Si:H FILMS

Martinz, R., Rodriguez, L., Vieira, M., Fortunato, E., Santos, M., Dirani, E., Carvalho, N., Baia, I., Guimaraes, L.

Materials Research Society
4 Conference Proceedings Novel Phase-Modulator for ELA-Based Lateral Growth of Si

Taniguchi, Y., Jyumonji, M., Ogawa, H., Hiramatsu, M., Matsumura, M.

Electrochemical Society
10 Conference Proceedings Role of the RF Power on the Structure of Defects in a-Si:H Films Produced by PECVD

Gordo, P.M., Subrahmanyam, V.S., Naia, M.D, Gil, C.L, de Lima, A.P., Lavareda, G., de Carvalho, C.N, Amaral, A.

Trans Tech Publications
5 Conference Proceedings PREPARATION OF a-Si:H FILMS BY VHF PLASMA CVD

Oda, S., Noda, J.’I., Matsumura, M.

Materials Research Society
11 Conference Proceedings VERTICAL-TYPE a-Si:H FIELD-EFFECT TRANSISTORS

Uchida, Y., Matsumura, M.

North Holland
6 Conference Proceedings Er Environment In a-Si:H Prepared By PECVD

MartinsAlves, M. C., Piamonteze, C., Terukov, E., Tessler, L. R., Tolentino, H., Weiser, G.

Materials Research Society
12 Conference Proceedings Etching Studies of Post-Annealed SiC Films Deposited by PECVD: Influence of the Oxygen Concentration

M. A. Fraga, R. S. Pessoa, M. Massi, H. S. Maciel, S. G. dos Santos Filho

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12