Low Temperature Deposition of Microcrystalline Silicon Films by Plasma Assisted CVD

Low Temperature Deposition of Microcrystalline Silicon Films by Plasma Assisted CVD

Author(s):

Grimaldi, A.

Publication title:

Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2003-8

Pub. Year:

2003

Page(from):

661

Page(to):

667

Pages:

7

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773782 [1566773784]

Language:

English

Call no.:

E23400/200308

Type:

Conference Proceedings

Details

TDL ID:	ZA00014071
Series ID:	PA00000028
Conf. info. (Name):	International Conference on Chemical Vapor Deposition ; EUROCVD ; Electrochemical Society Meeting
Conf. info. (Number):	16th ; 14th ; 203rd
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	2003.04.27-2003.05.02

Similar Items:

1 Conference Proceedings Plasma Enhanced Chemical Vapor Deposition of Er-Doped Amorphous Silicon Thin Films Giangregorio, M.M., Losurdo, M., Capezzuto, P., Bruno, G. Electrochemical Society	7 Conference Proceedings Epitaxial Growth and Processing of InP Films in a Novel Remote Plasma-MOCVD Apparatus Bruno,G., Losurdo,M., Capezzuto,P., Capozzi,V., Lorusso,F.G., Minafra,A. Trans Tech Publications
2 Conference Proceedings STUDY OF SiF4N2-H2 PLASMAS FOR THE DEPOSITION OF FLUORINATED SILICON NITRIDE FILMS Cicala, G., Bruno, G., Capezzuto, P., Losurdo, M. Materials Research Society	8 Conference Proceedings EFFECT OF PLASMA MODULATION IN THE GLOW DISCHARGE DEPOSITION OF AMORPHOUS SILICON FILMS Bruno, G., Capezzuto, P., Cicala, G., Manodoro, P. Materials Research Society
3 Conference Proceedings Low-Temperature Growth of HfO2 Dielectric Layers by Plasma-Enhanced CVD Losurdo, M., Giangregorio, M. M., Luchena, M., Capezzuto, P., Bruno, G., Barreca, D., Gasparotto, A., Tondello, E. Materials Research Society	9 Conference Proceedings Interrelation of Bond Configuration and Optical Properties of μc-SiC Thin Films by Spectroscopic Ellipsometry Losurdo, M., Iannuzzi, G., Capezzuto, P., Bruno, G. Electrochemical Society
4 Conference Proceedings Enhancement of the Amorphous to Microcrystalline Phase Transition in Silicon Films Deposited by SiF4-H2-He Plasmas Cicala, G., Losurdo, M., Capezzuto, P., Bruno, G., Ligonzo, T., Schiavulli, L., Minarini, C., Rossi, M. C. MRS - Materials Research Society	10 Conference Proceedings Plasma-Assisted MOCVD Growth of ZnO Thin Films Losurdo, Maria, Giangregorio, Maria Michela, Capezzuto, Pio, Bruno, Giovanni, Malandrino, Graziella, Blandino, Manuela, … Materials Research Society
5 Conference Proceedings GaAs Plasma Processing Monitored by In Situ Ellipsometry Losurdo, M., Capezzuto, P., Bruno, G. Electrochemical Society	11 Conference Proceedings Plasma-Assisted MOCVD Growth of ZnO Thin Films Losurdo, Maria, Giangregorio, Maria Michela, Capezzuto,Pio, Bruno, Giovanni, Malandrino, Graziella, Blandino, Manuela, … Materials Research Society
6 Conference Proceedings GaN Growth by Remote Plasma MOCVD: Chemistry and Kinetics by Real Time Ellipsometry Losurdo, M., Capezzuto, P., Bruno, G. MRS - Materials Research Society	12 Conference Proceedings Deposition of Photoluminescent Nanocrystalline Silicon Films by SiF4-SiH4-H2 Plasmas Cicala, G., Bruno, G., Capezzuto, P., Schiavulli, L., Capozzi, V., Perna, G. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12