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Compatibility of Polysilicon with HfO2-based Gate Dielectrics for CMOS Applications

Author(s):
Kaushik, V.
De Gendt, S.
Caymax, M.
Young, E.
Rohr, E.
Van Elshocht, S.
Delabie, A.
Claes, M.
Shi, X.
Chen, I.
Carter, R.
Conard, T.
Vandervorst, W.
Schaekers, M.
Heyns, M.
10 more
Publication title:
ULSI Process Integration : proceedings of the International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-6
Pub. date:
2003
Page(from):
391
Page(to):
396
Pages:
6
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773768 [1566773768]
Language:
English
Call no.:
E23400/200306
Type:
Conference Proceedings

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